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KIST and LETI Collaborate on R&D for Next-generation Semiconductor (2016.07.11)
- Date : 2016-11-09
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KIST and LETI Collaborate on R&D for Next-generation Semiconductor
- MOU ensures joint collaboration for leading the world in semiconductor technology -
On July 13, the Korea Institute of Science and Technology (KIST) and LETI, an institute of the French Atomic Energy Commission, signed an MOU to strengthen R&D cooperation on the next-generation semiconductor.
Through its R&D on electronic devices based on ultra-low power compound semiconductors, the Post-Silicon Semiconductor Institute, which KIST established in January 2015, carries out research projects for developing a post-silicon semiconductor that can perform 100 times faster than the current silicon one. Development is scheduled for completion in 2018 and commercialization in 2022. In addition, the institute carries out various semiconductor research projects such as the neuromorphic semiconductor chip and quantum computing technology, which is the core platform technology for Industrial Revolution 4.0 and the future society of IoT.
LETI’s major field of research is nanotechnology, system semiconductors based on the semiconductor application process, wireless devices/systems, compound semiconductor integration and internal medicine. Currently, it is expanding into research on efficiently integrating silicon devices with compound semiconductors.
Through the MOU, KIST and LETI will pursue joint research projects in opto-electronic convergence technology, neuromorphic semiconductor chips for artificial intelligence, post non-volatile memory, SPIN electronic devices and ultra-low power consumption semiconductors.
Jang Joon-yeon, Director of the Post-Silicon Semiconductor Institute, stated, “This MOU with LETI will expand the international collaboration network, giving KIST the upper-hand in leading the world in post silicon semiconductor technology development.”
Carlo Reita, head of LETI’s Nano Electro Device Technology Division, said, “KIST has greatly contributed to establishing the network of national research institutes in Korea, just as LETI did in France. This MOU reflects the essential technologies that need to be developed for enhanced industrial productivity, accelerated business innovation and a better life for mankind.”
The current semiconductor technology, represented by Si, primarily focuses on size reduction. Recently, 10nm device technology was developed, pushing the limits of Si semiconductor size reduction, which is believed to max out at 7nm. Other advanced economies including the US, Japan and the EU are exerting nation-wide efforts to secure a competitive advantage in post silicon semiconductor technology through the usage of new materials and innovative mechanisms, as well as the widening of the technological gap between them and latecomers as a result of research collaboration among advanced nations. Korea currently leads the market in regard to Si-based memory devices. As the limitations of current technologies become apparent, it is critical for not only businesses but the nation as a whole to pay attention to this exciting new technological field.